Dr. Qiang Xu
Kavli Institute of Nanoscience, Delft University of Technology,The Netherlands Authors | Qiang Xu, Meng-Yue Wu, Grégory F. Schneider, Lothar Houben, Sairam K. Malladi, Cees Dekker, Emrah Yucelen, Rafal E. Dunin-Borkowski and Henny W. Zandbergen. Email | firstname.lastname@example.org
|Application||Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature|
|Authors||Qiang Xu, Meng-Yue Wu, Grégory F. Schneider, Lothar Houben, Sairam K. Malladi, Cees Dekker, Emrah Yucelen, Rafal E. Dunin-Borkowski and Henny W. Zandbergen.|
|Journal||ACS Nano, 2013, 7 (2), pp 1566–1572|
|Topic||Contamination Free, 2D Materials, Soft Matter, E-Beam Sensitive Imaging|
|Field||Material Science, Chemistry, Electronics, Life Science|
|Techniques||HRTEM, HRSTEM, EELS, Diffraction|
|Keywords||Graphene; Controlled Sculpting; Nondestructive Imaging; Nanopatterning; Self-repair|
|Publication / D.O.I.||Full Publication Here – DOI: 10.1021/nn3053582|
Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature
ABSTRACT: In order to harvest the many promising properties of graphene in (electronic) applications, a technique is required to cut, shape, or sculpt the material on the nanoscale without inducing damage to its atomic structure, as this drastically influences the electronic properties of the nanostructure. Here, we reveal a temperature-dependent self-repair mechanism that allows near-damage-free atomic-scale sculpting of graphene using a focused electron beam. We demonstrate that by sculpting at temperatures above 600 C, an intrinsic self-repair mechanism keeps the graphene in a single-crystalline state during cutting, even though the electron beam induces considerable damage. Self-repair is mediated by mobile carbon ad-atoms that constantly repair the defects caused by the electron beam. Our technique allows reproducible fabrication and simultaneous imaging of single-crystalline free-standing nanoribbons, nanotubes, nanopores, and single carbon chains.
Objective & Goal
Graphene, carbon nanotube and other soft-mater materials suffers irradiation damage caused by high energy electron beam during TEM characterization. The e-beam damage limits the observation time or observation electron beam condition, thus requiring a way to prevent. Moreover, application of graphene needs to patterning graphene into various functional devices with nano-size geometry. The e-beam induced damage can be utilized for creating a lithography method for graphene patterning. Achieving control of e-beam damage of graphene becomes an essential topic.
DENSsolutions heating system provides the extreme high stability of sample at elevated temperature (sample spatial drift less than 0.5nm/min) At the elevated temperature, the e-beam induced defects of the sample can be repaired with a corresponding speed, therefore, provides an extra parameter for control of e-beam damage.