Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature

ABSTRACT: In order to harvest the many promising properties of graphene in (electronic) applications, a technique is required to cut, shape, or sculpt the material on the nanoscale without inducing damage to its atomic structure, as this drastically influences the electronic properties of the nanostructure. Here, we reveal a temperature-dependent self-repair mechanism that allows near-damage-free atomic-scale sculpting of graphene using a focused electron beam. We demonstrate that by sculpting at temperatures above 600 C, an intrinsic self-repair mechanism keeps the graphene in a single-crystalline state during cutting, even though the electron beam induces considerable damage. Self-repair is mediated by mobile carbon ad-atoms that constantly repair the defects caused by the electron beam. Our technique allows reproducible fabrication and simultaneous imaging of single-crystalline free-standing nanoribbons, nanotubes, nanopores, and single carbon chains.

DENSsolutions Comments

Objective & Goal

Graphene, carbon nanotube and other soft-mater materials suffers irradiation damage caused by high energy electron beam during TEM characterization. The e-beam damage limits the observation time or observation electron beam condition, thus requiring a way to prevent. Moreover, application of graphene needs to patterning graphene into various functional devices with nano-size geometry. The e-beam induced damage can be utilized for creating a lithography method for graphene patterning. Achieving control of e-beam damage of graphene becomes an essential topic.

Benefit

DENSsolutions heating system provides the extreme high stability of sample at elevated temperature (sample spatial drift less than 0.5nm/min) At the elevated temperature, the e-beam induced defects of the sample can be repaired with a corresponding speed, therefore, provides an extra parameter for control of e-beam damage.

Atomic Resolution Imaging and Spectroscopy of Barium Atoms and Functional Groups on Graphene Oxide

DENSsolutions Comments:

Graphene, graphene-like two dimensional and other soft-mater materials attract  increasing research efforts. Characterization of these type of materials in TEM, however, suffers contamination problems and e-beam damage.
Contamination, referring to the build-up of decomposed carbon on a specimen, heavily influences the quality of electron microscopy imaging. Graphene  and graphene-like two dimensional materials suffer contamination the most because of two reasons 1. these materials are ultrathin, with low image contrast,  the build up contamination contrast blur the original contrast easily; 2. these materials are with large surface area, easier to absorb hydrocarbon, water to form contamination under e-beam.
DENSsolutions heating system provides the opportunity to image these samples free of contamination at elevated temperature, without sacrificing the quality/resolution of imaging. The extreme high stability of DENSsolutions heating system (sample spatial drift less than 0.5nm/min) can even allow the researchers using a long exposure time (5s-8s) to  image the individual carbon atoms for improving the contrast. Furthermore, the low drift allows chemical sensitive spectrum imaging to be carried down to atomic level.